MENTORING PROGRAM
A PROVEN PATH FOR INDEPENDENT DESIGNERS
Over the past 10 years, LIGNES DE FUITE’s Mentoring Program has helped launch some of the most original and ambitious young designers working in Montreal and beyond. More than a course, it’s a transformative journey that gives you the structure, mentorship, and tools to move from raw ideas to a sustainable practice. Our alumni have gone on to present collections, start brands, show at fashion week, win awards, and develop lasting relationships with our team and community. For many, this program was the turning point.
It’s built for recent graduates and early-career designers who are serious about becoming independent—but who need help bridging the gap between school and professional life. It’s a place to experiment and grow, while receiving real feedback, hands-on support, and access to infrastructure that would otherwise be out of reach. This is not a one-off masterclass. It’s a long-term investment in your development—and a gateway to ongoing collaboration, professional opportunities, and future programs.
The cost is $225/month, with weekly meetings, studio access, professional mentorship, and three public events that help build your visibility and portfolio. For the right candidate, the value is incomparable.
WHO IT’S FOR
This program is for talented, driven designers who want to develop their voice, build credibility, and create a fashion practice that’s both creative and financially sustainable. If you’re full of ideas but lacking resources… if you’re motivated but overwhelmed… if you know where you want to go but don’t know how to get there—this is for you.
We keep the cohort small—6 to 8 mentees maximum—so that every participant can be supported closely and meaningfully. Our aim is to help you avoid burnout and bypass the most common pitfalls by offering expert guidance, shared infrastructure, and a safe place to experiment.
PROGRAM OVERVIEW
The Mentoring Program runs from September to September. We meet weekly on Sunday afternoons at our studio, with the space reserved for mentees all day Sunday. Participants also benefit from free access to our Open Studio hours—Wednesdays from 6 to 9 PM and Saturdays from 2 to 5 PM—allowing additional time for production, prototyping, and experimentation.
The program is structured in three progressive modules, each ending in a public-facing event: From September to December, you’ll focus on Design Research, culminating in an exhibit that shares your conceptual direction and early visual work. From January to June, you’ll work on Prototyping Editorial Looks, concluding with a full runway presentation at our June edition of ON SHOW. The third module is about Developing a Scalable Product, which wraps up with a showroom presentation during the SUPPLY pop-up. This is your first opportunity to present a product for retail or pre-order under your name.
Each module builds on the one before it. By the end, you’ll have both creative and commercial outputs, as well as a stronger sense of who you are as a designer—and how to structure your practice going forward.
MENTORSHIP & SUPPORT
The program is led by Milan Tanedjikov, who serves as the main mentor and anchor throughout the year. Milan brings decades of experience in concept development, creative strategy, and design education. His approach is rigorous but human—focused on helping you shape your identity, understand your audience, and plan for the future.
You’ll also receive hands-on technical support from Barbora Sanakova during the prototyping phase. Barbora is a master of pattern-making and sewing, and works with each participant to bring their vision to life in physical form. In the final module, focused on product and scalability, you’ll be supported by Wen Liu, whose expertise in sourcing, costing, and production systems is key to turning ideas into viable business models.
Guest mentors contribute throughout the year. These include George Fok (visual storytelling and image development), Raphaël Viens (collection structure and brand positioning), and Danny Gauthier (textile developemnt ), among others. We also regularly invite past alumni who share insights, experiences, and realities from the field—strengthening the sense of continuity and peer-led learning.
OUTCOMES & ONGOING SUPPORT
By the end of the program, you’ll have built a complete three-look collection, a market-ready product, and a portfolio that demonstrates both vision and professionalism. But more importantly, you’ll leave with a concrete understanding of what it takes to sustain a fashion practice—and how to do it on your own terms.
Graduation is not the end of the relationship. Many mentees go on to join our Designer-in-Residence program, participate in our runway shows, exhibit their work through our retail platform, or take part in future projects as collaborators, freelancers, or mentors themselves. The bonds created here are strong and often long-lasting. This isn’t just a course—it’s a community.
If you’re ready to take your practice seriously and build the foundations of your career with expert guidance and genuine care, we encourage you to apply.
APPLICATION PROCESS
Applications are now open for the next cycle of the Mentoring Program, which begins on September 21, 2025. The application deadline is August 22, 2025.
This is a selective program designed for designers who are ready to commit to their growth. We typically receive between 20 and 30 applications and accept only 6 to 8 mentees per year. We’re looking for creative clarity, technical skill, and the kind of ambition that’s grounded in long-term vision. You don’t need to have all the answers—but you do need to be serious about building your practice.
Applications are reviewed by a small team of mentors and creative leaders who have been central to shaping the culture of LIGNES DE FUITE. This includes Milan Tanedjikov, founder and program lead; George Fok, renowned image maker and director; and Raphaëlle Viens, designer and creative director with deep roots in the Montreal fashion community. Together, they assess not only the strength of your portfolio, but your readiness to engage fully with the process, challenge yourself, and take advantage of the resources we offer.
If you’re ready to push your work to the next level, gain credibility and visibility, and step into a supportive yet rigorous ecosystem, we encourage you to apply.
APPLY NOW